Electronographic investigation of the temperature effect on the phase formation in thin double-layer Ni/GaAs films

dc.contributor.authorGladkikh, N.T.
dc.contributor.authorGrebennik, I.P.
dc.contributor.authorDukarov, S.V.
dc.date.accessioned2015-12-12T19:32:24Z
dc.date.available2015-12-12T19:32:24Z
dc.date.issued1998
dc.description.abstractThe results of an electronographic investigation of the Ni—GaAs double-layer films phase composition depending on temperature at condensation of Ni at GaAs are presented. The structure and number of the phases being formed have been shown to depend both on ther-mal conditions at interaction of the Ni and GaAs layers and on the Ni to GaAs layer mass ratio: mNi//mGaAs = (0.5; 1.2).ru_RU
dc.identifier.citationGladkikh N.T., Grebennik I.P., Dukarov S.V. Electronographic investigation of the temperature effect on the phase formation in thin double-layer Ni/GaAs films // Met. Phys. Adv. Tech. – 1998. – V. 17. – P. 725–734.ru_RU
dc.identifier.urihttps://ekhnuir.karazin.ua/handle/123456789/11055
dc.language.isoenru_RU
dc.subjectThin filmsru_RU
dc.subjectgallium arsenideru_RU
dc.subjectcrystal structureru_RU
dc.subjectResearch Subject Categories::NATURAL SCIENCES::Physics::Condensed matter physics::Surfaces and interfacesru_RU
dc.titleElectronographic investigation of the temperature effect on the phase formation in thin double-layer Ni/GaAs filmsru_RU
dc.typeArticleru_RU

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